HIDE: Skin as Material and Metaphor (Part I)

March 6, 2010–August 1, 2010
New York, NY

The artists selected for HIDE draw upon this rich subject in multi-faceted ways, using both the material and concept of skin as a metaphor for widespread issues surrounding race, representation, as well as personal, historical and environmental trauma and perseverance. Part I features solo installations by Sonya Kelliher-Combs (Inupiaq/Athabascan) and Nadia Myre (Anishinaabe). Part II includes works by Michael Belmore (Ojibway) and photographers Arthur Renwick (Haisla), KC Adams (Métis), Terrance Houle (Blood), Rosalie Favell (Cree Métis), and Sarah Sense (Chitimacha/Choctaw).